| 摘要 |
PROBLEM TO BE SOLVED: To detect an error which is caused by taking an incorrect mask at manufacture of an integrated circuit which has a specified function desired by user. SOLUTION: This integrated circuit has the second structure S2 which is used for materializing a predetermined function generated using an exposure mask MSKi on a plurality of fixed wiring levels M1, M2, P, and is used for inspecting the attribution of a used mask to a common mask set MSKS, on the plurality of fixed wiring levels, in addition to the first structure S1. |
