发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive element, a method for producing a resist pattern and a method for producing a printed wiring board. SOLUTION: In the photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in one molecule and (C) a photopolymerization initiator, the component B has (b1) a bisphenol A type (meth)acrylate compound, (b2) a polypropylene glycol diacrylate and (b3) a phenoxypolyethyleneoxy (meth) acrylate compound as essential components. The photosensitive resin composition is applied on a substrate, dried and laminated, the resulting photosensitive element is laminated on a substrate for circuit formation in a contact state and imagewise irradiated with active light, the exposed part is photo-cured and the unexposed part is removed by development to produce the resist pattern. The substrate with the produced resist pattern is etched or plated to produce the printed wiring board.
申请公布号 JP2001174986(A) 申请公布日期 2001.06.29
申请号 JP19990355854 申请日期 1999.12.15
申请人 HITACHI CHEM CO LTD 发明人 HIDAKA TAKAHIRO;NATORI MICHIKO
分类号 H05K3/06;C08F220/30;C08L33/14;G03F7/004;G03F7/027;H05K3/00;H05K3/18 主分类号 H05K3/06
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