发明名称 METHOD AND APPARATUS FOR PARTIALLY PLATING LEAD FRAME
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for plating a lead frame partially, which can prevent unnecessary increase in lead frame manufacturing costs as well as malfunction of a semiconductor device using a lead frame. SOLUTION: With this method of plating a lead frame partially, a gas flowing from a masking jig 10 towards a portion lm to be plated between respective leads l of a lead frame F so that infiltration of a plating solution between the respective leads l in the masking jig 10 is prevented. In this apparatus 1 for plating a lead frame partially, the masking jig 10 has a gas supplying passage 10P connected to an air blower 30 (gas supply means), so that a gas is supplied between the leads l of the lead frame F. Infiltration of the plating solution between the leads l in the masking jig 10 is prevented by allowing the gas from a gas supply port 10o to flow towards the portion lm to be plated.
申请公布号 JP2001177033(A) 申请公布日期 2001.06.29
申请号 JP19990359065 申请日期 1999.12.17
申请人 MITSUI HIGH TEC INC 发明人 ISHIKAWA KOICHI
分类号 H01L23/50;C25D5/02;C25D7/12;C25D17/00;(IPC1-7):H01L23/50 主分类号 H01L23/50
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