PHOTOSENSITIVE MATERIAL PROCESSING METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a processing device which can stably apply a processing liquid with a low coating quantity uniformly in both of an axial direction and flow direction in spite of long-term practicable use and is extremely minimizes or entirely eliminates a waste liquid. SOLUTION: The method for processing the photosensitive materials which measures and applies the processing liquid for processing the photosensitive materials by using a slot die consists in using a slot die of <=0.5 millimeter in the thickness C of the slit part, B>50×C/μ0.3 (μis the viscosity [centipoise] of the processing liquid) when the length of the slit part is defined as B millimeter and >=0.1 to <=5 millimeter in the length A of a lip land.