发明名称 ELECTRON BEAM IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation device preventing a window part of an electron beam tube from being polluted by an impurity gas, to hold the output of the electron beam constant, to prevent the window part from being broken, and to easily shift the electron beam relative to a material to be processed at a desired speed. SOLUTION: The electron beam irradiation device processing the material 5 to be processed by irradiating the electron beam thereto is characterized by a means shifting an electron beam irradiation device body 1 having the electron beam tube 2, relative to the material 5 to be processed in processing the material 5 to be processed by irradiating the electron beam thereto.
申请公布号 JP2001174596(A) 申请公布日期 2001.06.29
申请号 JP19990363242 申请日期 1999.12.21
申请人 USHIO INC 发明人 YAMAGUCHI MASANORI
分类号 G21K5/04;(IPC1-7):G21K5/04 主分类号 G21K5/04
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