| 摘要 |
PROBLEM TO BE SOLVED: To provide a color filter for a liquid crystal suppressing the peeling-off of a spacer. SOLUTION: In usual proximity exposure, the exposure is carried out setting a photomask 18 apart from a resin material 2 by about 10 μm for the purpose of uniformly forming desired distribution of latent image concentration along thickness direction of a photoresist. In this invention, the spacer 1 consists of the hardened photoresist. In its formation, the photomask is placed in a position upwardly apart from an exposed surface of the photoresist by 50-300 μm. The photoresist is exposed via the photomask. The release of the spacer is suppressed because the distribution of the latent image concentration with a trapezoidal vertical sectional shape is formed inside the photoresist. |
