发明名称 PROCESSING SYSTEM FOR APPLICATION AND DEVELOPMENT
摘要 PROBLEM TO BE SOLVED: To provide a processing system with a new form in application of photosensitive solution and development for driving all kinds of jetting nozzles using a single actuator. SOLUTION: This processing system includes a chuck for supporting a substrate, at least a processing solution spouting nozzle for jetting the processing solution like a photosensitive or development solution to the substrate mounted on the chuck, a cleaning solution jetting nozzle for jetting a cleaning solution to the substrate mounted on the chuck, an actuator for selecting one nozzle out of at least one processing solution jetting nozzle and the cleaning solution jetting nozzle and moving the nozzle above the substrate, and a controller for controlling the actuator. In this system, the various kinds of jetting nozzles can be driven by using a single actuator, so that the space of the process system for application of photosensitive solution and development can be saved, and the effective use of the space is realized. At the same time, the cost of the process system for application of photosensitive solution, and development can be reduced.
申请公布号 JP2001176793(A) 申请公布日期 2001.06.29
申请号 JP20000245092 申请日期 2000.08.11
申请人 DNS KOREA CO LTD 发明人 NO HYONRE;SHIN KIFAN;KANG HEE YOUNG
分类号 G03F7/16;B05C5/00;B05C9/02;B05C11/00;B05D1/40;G03D5/00;G03F7/30;H01L21/027 主分类号 G03F7/16
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