METHOD FOR MANUFACTURING BACK SUBSTRATE FOR PDP

摘要

PURPOSE: A method for manufacturing back substrate for PDP is provided to be capable of manufacturing a phosphor by using a back substrate for PDP. CONSTITUTION: A phosphor pattern comprises a substrate(1) having unevenness and a phosphor layer(5) formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (μm), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9xL from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4xL from the bottom of the concave portion toward the top of the convex portion.