发明名称 Power semiconductor device
摘要 In a semiconductor device having a first terminal 101 (source terminal) and a second terminal 102 (drain terminal), the substrate main surface of a semiconductor chip is on the (110) face, the main contact face of an n-type region 2 and a p-type region 4 is the {111} face perpendicular to the (110) face, elongated n-type regions 2 and elongated p-type regions 4 which are arranged alternately and adjacently form a voltage holding area, said first terminal 101 is connected to said p-type regions through wiring, and said second terminal 102 is connected to said n-type regions 2. Also, said p-type region is formed to cover the bottom corners of a gate polycrystalline silicon layer 8.
申请公布号 US2001005031(A1) 申请公布日期 2001.06.28
申请号 US20000733098 申请日期 2000.12.11
申请人 SAKAMOTO KOZO;INOUE YOSUKE;MIYAUCHI AKIHIRO;SHIRAISHI MASAKI;MORI MUTSUHIRO;WATANABE ATSUO;OHYANAGI TAKASUMI 发明人 SAKAMOTO KOZO;INOUE YOSUKE;MIYAUCHI AKIHIRO;SHIRAISHI MASAKI;MORI MUTSUHIRO;WATANABE ATSUO;OHYANAGI TAKASUMI
分类号 H01L21/336;H01L29/04;H01L29/06;H01L29/08;H01L29/10;H01L29/12;H01L29/423;H01L29/732;H01L29/739;H01L29/772;H01L29/78;H01L29/872;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L21/336
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