发明名称 Production of a ferroelectric capacitor on a semiconductor substrate comprises depositing a ferroelectric capacitor material over a first electrode, producing a second electrode and applying an alternating voltage on the capacitor
摘要 Production of a ferroelectric capacitor (10) on a semiconductor substrate (1) comprises producing first electrode (11); depositing ferroelectric capacitor material (13) over first electrode; producing second electrode (12) over the ferroelectric capacitor material; and applying an alternating voltage on the capacitor so that current loss in the capacitor is reduced by more than a factor of 10. An Independent claim is also included for the capacitor produced. Preferred Features: The second electrode is made from Al, W, Cu, TiNx, WNx, TaNx, TiWNx, WSix, TiSix or TaSix.
申请公布号 DE19957122(A1) 申请公布日期 2001.06.28
申请号 DE19991057122 申请日期 1999.11.26
申请人 INFINEON TECHNOLOGIES AG 发明人 SCHINDLER, GUENTHER;HARTNER, WALTER
分类号 H01L21/02;H01L21/3105;H01L21/314;H01L27/115;(IPC1-7):H01G7/06;H01L21/823 主分类号 H01L21/02
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