发明名称 Process for measuring ethylene comprises subjecting a measuring gas containing ethylene and ozone in excess to a homogeneous gas phase reaction in a reaction chamber
摘要 Process for measuring ethylene comprises subjecting a measuring gas containing ethylene and ozone in excess to a homogeneous gas phase reaction in a reaction chamber. A chemiluminescent beam is produced by the gas phase reaction and is measured by a photomultiplier. The measured beam is a measure for the ethylene content in the measuring gas. An Independent claim is also included for a device for measuring ethylene comprising a reaction chamber having inlet openings for ozone in excess and a measuring gas containing ethylene and an outlet opening for a waste gas stream.
申请公布号 DE19962381(A1) 申请公布日期 2001.06.28
申请号 DE19991062381 申请日期 1999.12.23
申请人 DEKA SENSOR + TECHNOLOGIE ENTWICKLUNGS- UND VERTRIEBSGESELLSCHAFT MBH 发明人 MARTINI, LOTHAR;STARK, BERND;WERNECKE, ROLAND;WONNEBERGER, REINER;ZEHNER, CHRISTIAN
分类号 G01N21/76;(IPC1-7):G01N21/76 主分类号 G01N21/76
代理机构 代理人
主权项
地址