发明名称 |
Process for measuring ethylene comprises subjecting a measuring gas containing ethylene and ozone in excess to a homogeneous gas phase reaction in a reaction chamber |
摘要 |
Process for measuring ethylene comprises subjecting a measuring gas containing ethylene and ozone in excess to a homogeneous gas phase reaction in a reaction chamber. A chemiluminescent beam is produced by the gas phase reaction and is measured by a photomultiplier. The measured beam is a measure for the ethylene content in the measuring gas. An Independent claim is also included for a device for measuring ethylene comprising a reaction chamber having inlet openings for ozone in excess and a measuring gas containing ethylene and an outlet opening for a waste gas stream.
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申请公布号 |
DE19962381(A1) |
申请公布日期 |
2001.06.28 |
申请号 |
DE19991062381 |
申请日期 |
1999.12.23 |
申请人 |
DEKA SENSOR + TECHNOLOGIE ENTWICKLUNGS- UND VERTRIEBSGESELLSCHAFT MBH |
发明人 |
MARTINI, LOTHAR;STARK, BERND;WERNECKE, ROLAND;WONNEBERGER, REINER;ZEHNER, CHRISTIAN |
分类号 |
G01N21/76;(IPC1-7):G01N21/76 |
主分类号 |
G01N21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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