| 摘要 |
A micromachined reflective arrangement for manipulating beams of light is described. The micromachined reflective arrangement includes a substrate, first and second adjacent reflector arrangements, and at least a first barrier. Each respective reflector arrangement includes a respective mirror component which is secured for pivotal movement to the substrate. The mirror component has a reflective surface from which a respective beam of light can be reflected in a selected direction relative to the substrate. Each reflector arrangement includes at least a first electrostatic contact to which a voltage can be applied to cause electric field interaction between the first electrostatic contact and a first respective area of the respective mirror component so that the respective mirror component pivots relative to the substrate and the selected direction in which the perspective beam of light is reflected is changed. The first barrier is located between the first and second arrangements. The first barrier restricts electric field interaction between the first electrostatic contact of the first reflector arrangement with the first area of the mirror component of the second reflector arrangement. Pivoting of the mirror component of the second reflector arrangement is thereby restricted when a voltage is applied to the first electrostatic contact of the first reflector arrangement.
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