发明名称 A coating apparatus having a cleaning arrangement
摘要 <p>An apparatus (7) and method for applying at least one coating solution (9) of a predetermined viscosity to a photosensitive material (11). The apparatus includes at least an application roller which is adapted to apply the coating solution onto the photosensitive material. A solution supply guide (25) is positioned relative to the application roller to supply coating solution onto the application roller. The apparatus and method further includes a washing arrangement (40) for washing the coating apparatus in an efficient manner. The washing arrangement includes a movable scrubber bar arrangement which retracts away from the application roller when the coating apparatus is in a coating mode of operation, and is movable to contact the application roller by way of brushes in a cleaning mode of operation. The apparatus and method further includes a recirculation system (45) which alternatively supplies coating solution to the supply guide (25) and cleaning solution to at least the washing arrangement. &lt;IMAGE&gt;</p>
申请公布号 EP1111462(A1) 申请公布日期 2001.06.27
申请号 EP20000204440 申请日期 2000.12.11
申请人 EASTMAN KODAK COMPANY 发明人 PICCININO, RALPH LEONARD;BLAKELY, KEVIN H.
分类号 G03D15/02;G03D15/06;(IPC1-7):G03D15/02 主分类号 G03D15/02
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