Apparatus and method for forming thin film

摘要

The present invention is drawn to an apparatus for forming a thin film. The apparatus includes a vacuum chamber (10); a vacuum apparatus (11) connected to the vacuum chamber; a holder (20) placed in the vacuum chamber, which holder holds a substrate and is rotated by means of a rotating mechanism (21); a plasma CVD apparatus (30) and a sputtering apparatus (40), wherein the plasma CVD apparatus and the sputtering apparatus are placed in a single vacuum chamber and a thin film having a medium refractive index is formed on the substrate held by the holder, by means of the plasma CVD apparatus and the sputtering apparatus. The method making use of such an apparatus is also disclosed.