| 发明名称 |
WASTE GAS TREATING METHOD |
| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for inexpensively and easily decomposing the waste gas containing methylene chloride as main solvent without forming a harmful material by irradiating the waste gas with electron beam. SOLUTION: In the waste gas treating method, the gas containing at least one kind halogen is irradiated with the electron beam.</p> |
| 申请公布号 |
JP2001170447(A) |
申请公布日期 |
2001.06.26 |
| 申请号 |
JP19990354661 |
申请日期 |
1999.12.14 |
| 申请人 |
JAPAN ATOM ENERGY RES INST;FUJI PHOTO FILM CO LTD |
发明人 |
SURI WAHYONI;HIROTA KOICHI;HAKODA TERUYUKI;ARAI HIDEHIKO;HASHIMOTO SHOJI;KAWAMOTO FUMIO;KURAKI YASUO |
| 分类号 |
B01D53/70;B01D53/32;B01D53/72;(IPC1-7):B01D53/70 |
主分类号 |
B01D53/70 |
| 代理机构 |
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