| 发明名称 |
Forming a pattern of a negative photoresist |
| 摘要 |
A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.
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| 申请公布号 |
US6251569(B1) |
申请公布日期 |
2001.06.26 |
| 申请号 |
US19990373555 |
申请日期 |
1999.08.13 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ANGELOPOULOS MARIE;BABICH EDWARD D.;BABICH INNA V.;BABICH KATHERINA E.;BUCCHIGNANO JAMES J.;PETRILLO KAREN E.;RISHTON STEVEN A. |
| 分类号 |
G03F7/033;C08F20/26;G03F7/038;G03F7/075;H01L21/027;(IPC1-7):G03F7/30;G03F7/004 |
主分类号 |
G03F7/033 |
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