| 摘要 |
An apparatus is provided for supporting fabric placed in a frame attached to an embroidery machine to relieve the weight of the fabric and allow the embroidery frame to move under the embroidery needle, the apparatus including a pair of lightweight, slidable supports, one of each being positioned under each end of the fabric secured in the embroidery frame so as to slightly elevate and support the fabric above the plane of the embroidery frame. The supports preferably are hollow and round having a flat top wall and a bottom wall. Each top wall includes a strap to secure fabric to the support. The bottom wall is smooth and flat and slides easily on a support surface. In one preferred embodiment, the top wall of the support is removable, allowing the inner chamber of the support to be used for storage of lightweight materials. The device also can employ only one support if appropriate.
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