发明名称 |
Photoresist compositions with cyclic olefin polymers having lactone moiety |
摘要 |
Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form photoresist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing cyclic olefin polymer having a cyclic olefin monomer having a lactone moiety, the monomer having no oxygen atoms intervening between the lactone moiety and a ring of the cyclic olefin. Preferred lactone moieties are spirolactones (having a 5 or 6 membered ring) directly to a cyclic olefin ring.
|
申请公布号 |
US6251560(B1) |
申请公布日期 |
2001.06.26 |
申请号 |
US20000566395 |
申请日期 |
2000.05.05 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
WALLOW THOMAS I.;ALLEN ROBERT D.;BROCK PHILLIP JOE;DIPIETRO RICHARD ANTHONY;ITO HIROSHI;TRUONG HOA DAO;VARANASI PUSHKARA RAO |
分类号 |
G03F7/004;G03F7/039;G03F7/11;G03F7/40;H01L21/027;(IPC1-7):B03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|