发明名称 APPARATUS FOR PRODUCING HIGH-PURITY AQUEOUS SOLUTION OF HYDROGEN PEROXIDE
摘要 PROBLEM TO BE SOLVED: To provide a production apparatus usable in the field of precision electronics industry, capable of readily obtaining an aqueous solution of hydrogen peroxide having an extremely low impurity and yet a high concentration of hydrogen peroxide, suitable for producing a high-purity aqueous solution of hydrogen peroxide. SOLUTION: This apparatus for producing the high-purity aqueous solution of hydrogen peroxide comprises a distillation column (A) equipped with a piping (1) for supplying a crude aqueous solution of hydrogen peroxide at the bottom part of the column, a piping (3) for extracting a high-purity aqueous solution of hydrogen peroxide at the middle part and a piping (5) for injecting extrapure water and a piping (4) for extracting a distillate at the top of the column, having an inner wall made of fluororesin and packed with a rectification member made of a fluororesin and a falling film type reboiler (D) attached through a piping (6) for discharging a bottom liquid and a piping (11) for reintroducing the heated bottom liquid to the bottom part of the distillation column.
申请公布号 JP2001172008(A) 申请公布日期 2001.06.26
申请号 JP20000290117 申请日期 2000.09.25
申请人 UBE IND LTD 发明人 INABA YUKIO;UENO YOSUKE;WATABE MASAHIKO;NISHIDA YUKIHIRO
分类号 B01D3/00;C01B15/013;H01L21/306;(IPC1-7):C01B15/013 主分类号 B01D3/00
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