| 发明名称 |
Reticle adapter for a reactive ion etch system |
| 摘要 |
A reticle adapter that is capable of supporting a reticle in a conventional reactive ion etch chamber that is designed for etching circular silicon wafers. The adapter has a lower portion that is milled to cover the upper portion of a pedestal within a reactive ion etch chamber. A top portion of the adapter has an opening that is sized and shaped to hold a reticle.
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| 申请公布号 |
US6251217(B1) |
申请公布日期 |
2001.06.26 |
| 申请号 |
US19990238205 |
申请日期 |
1999.01.27 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
YE YAN;PLAVIDAL RICHARD W. |
| 分类号 |
G03F1/08;H01L21/00;H01L21/302;H01L21/306;H01L21/3065;H01L21/683;(IPC1-7):H01L21/00;C23C16/00 |
主分类号 |
G03F1/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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