| 摘要 |
PURPOSE: An evaporator for an installation for a CVD(Chemical Vapor Phase deposition) is disclosed. CONSTITUTION: The evaporator comprises: a) an admission head equipped with at least one injector(18), or a spray nozzle, having an inlet(20) for the admission of liquid precursors; b) a control circuit for periodic injection into an evaporation chamber(16) of droplets with a predetermined volume of the liquid precursors, or a continuous or pulsed flow of aerosol; c) some means for the injection of a vector gas into the evaporation chamber; d) a heating system to heat the evaporation chamber to ensure the change of liquid/vapor state of the liquid precursors; and e) at least one outlet tube to carry the injected vaporized precursors towards a reactor of the CVD installation, characterized in that it incorporates: (i) at least one orifice in the central part for the introduction of the injector(18); (ii) a circuit for the injection and heating of vector gas rendered active simultaneously with the injection of the liquid, the vector gas being directed in the neighborhood of the injector(18); and (iii) some means for cooling the injector(18), notably by the circulation of water or heat carrying fluid or by blowing air.
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