发明名称 |
OPTICAL PROJECTION LENS SYSTEM |
摘要 |
PURPOSE: An optical projection lens system is provided, which is for photolithography used in production of micro structured device comprising an integrated circuit and a semiconductor device. CONSTITUTION: A first lens group(G1) having a positive refracting power; a second lens group(G2) which has a negative refracting power and consists of a waist(37) having a minimum diameter of radiation to be propagated; and another lens array(G3) which is arranged following the second lens group and has a positive refracting power are provided in the propagation direction, and a lens having an aspherical surface(31) is arranged in front of the waist(37). Preferably only the second lens group(G2) contains an aspherical surface(31). The lens having a aspherical surface(31) is a concave lens.
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申请公布号 |
KR20010051115(A) |
申请公布日期 |
2001.06.25 |
申请号 |
KR20000061465 |
申请日期 |
2000.10.19 |
申请人 |
CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS |
发明人 |
SHAFER DAVID R.;ULRICH WILHELM |
分类号 |
G02B3/00;G02B9/00;G02B13/14;G02B13/18;G02B13/24;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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