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发明名称
A METHOD FOR TREATING A DEPOSITED FILM FOR RESISTIVITY REDUCTION
摘要
申请公布号
KR20010052609(A)
申请公布日期
2001.06.25
申请号
KR1020007013810
申请日期
2000.12.05
申请人
发明人
分类号
H01L21/768
主分类号
H01L21/768
代理机构
代理人
主权项
地址
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