| 摘要 |
PURPOSE: To provide a dielectric element of a structure, where voids and seams will not to generated, a Pt electrode having superior electrical characteristics can be formed simply and at the same time, the problems of contamination or the like a processing chamber are not generated and the formation of a microscopic pattern is possible in the dielectric element using a Pt layer as an electrode material, and the manufacturing method of the element. CONSTITUTION: This dielectric element, which is provided with a lower electrode, a dielectric layer and an upper electrode on a substrate, is formed into a dielectric element of a structure, where the electrode of at least either of the lower and upper electrodes of the element is formed as a Pt layer and at the same time, an Ru layer is used as the base layer of the Pt layer. In the manufacture of the element, the Pt layer is formed by an electroplating method, but at this time, a photoresist pattern is used as a plating mask and the Ru layer is formed as a seed layer.
|
