| 摘要 |
PURPOSE: An apparatus for processing liquid is provided to uniformly discharge developer from every discharge hole even when an ejection pressure of supplied developer is low, by embodying a wafer supporting unit, a linear nozzle and a resistance bar. CONSTITUTION: A substrate supporting unit horizontally supports a substrate. A liquid supply nozzle supplies the liquid to the upper surface of the substrate while moving in a predetermined horizontal direction, supported in the upper portion of the substrate supporting tool. A discharge resistance unit supplies discharge resistance to the liquid discharged from the nozzle, disposed in a front side of the substrate along the direction that the liquid supply nozzle proceeds.
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