发明名称 PROCESSOR
摘要 PURPOSE: A processor is provided to easily control circulation gas. CONSTITUTION: The processor has a shower head(200) supplying processing gas into a process chamber through several gas supply holes, a turbopump exhausting processing gas from the process chamber and a circulation gas piping(150) returning at least a part circulation gas(Q2) of exhaust gas exhausted from within the process chamber by the turbopump to the shower head. The shower head is provided with a primary gas supply system which supplies primary gas(Q1) supplied from a gas source into the process chamber through several primary gas jet holes(h1), and a circulation gas supply system supplying circulation gas into the process chamber through several circulation gas supply holes. The primary gas supplying system and the circulation gas supply system are independent systems. Since primary gas and circulation gas can be mixed in the process chamber for the first time, circulation gas can easily be controlled even if pressure control is not conducted.
申请公布号 KR20010050986(A) 申请公布日期 2001.06.25
申请号 KR20000060019 申请日期 2000.10.12
申请人 TOKYO ELECTRON LIMITED 发明人 HIRAYAMA YUSUKE;OHIWA TOKUHISA;SAITO MASASHI;SAKAI ITSUKO
分类号 H01L21/3065;B44C1/22;H01L21/00;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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