发明名称 N-SULFONYLOXYMIDE COMPOUND AND RADIATION-SENSITIVE RESIN COMPOSITION USING THE SAME
摘要 PURPOSE: Provided are an N-sulfonyloxyimide compound which can highly, sensitively and efficiently generate an acid, is free from the problems of evaporation and side-reactions, can inhibit a dark reaction on the storage of resists, and is useful as the radiation-sensitive acid-generating agent component of a radiation-sensitive chemical amplification type resist, and a positive type and negative type radiation-sensitive resin composition using the same. CONSTITUTION: The N-sulfonyloxyimide compound represented by formula(1), wherein X is a single bond or a double bond; Y and Z are each independently H, or together form a cyclic structure; R is a group represented by the general formula(2) £X1 is an organic group having an ester bond; R1 is an alkyl or alkoxy; (m) is an integer of 1 to 11; (n) is an integer of 0 to 10; and (m)+(n) <= 11|, and the chemical amplification type positive and negative radiation-sensitive resin composition containing a radiation-sensitive acid-generating agent.
申请公布号 KR20010051519(A) 申请公布日期 2001.06.25
申请号 KR20000066069 申请日期 2000.11.08
申请人 JSR CORPORATION 发明人 KOBAYASHI EIICHI;MIYAJI MASAAKI;NUMATA JUN;SHIMOKAWA TSUTOMU;WANG YONG
分类号 G03F7/028;C07D207/46;C07D209/76;G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03F7/028 主分类号 G03F7/028
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