发明名称 APPARATUS FOR AND METHOD OF MEASURING MICROROUGHNESS ON SURFACE OF SUBSTRATE COUPLING PARTICLE COUNTER AND ATOMIC FORCE MICROSCOPE
摘要 PURPOSE: An apparatus for and a method of measuring micro-roughness on surface of substrate coupling a particle counter and an atomic force microscope are provided to easily check the state of the micro-roughness of a certain local area selected out the surface of the substrate. CONSTITUTION: A certain part on the surface of a substrate is measured by using a particle counter to provide a first measurement value in response to a plurality of points on the surface of the substrate. The selected area including one out of the plurality of points, namely, the local area on the surface of the substrate, measured by the particle counter is measured by using an atomic force microscope to provide the micro-roughness value of the area selected. As for the measurement value of the surface of the substrate, the first measurement value and the micro-roughness measurement value are provided.
申请公布号 KR20010051128(A) 申请公布日期 2001.06.25
申请号 KR20000061549 申请日期 2000.10.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN, JEONG HUN;CHO, GYU CHEOL;HUH, TAE YEOL;KIM, GI JEONG
分类号 G01B21/30;G01B7/34;G01B11/30;G01N15/08;G01N19/08;G01Q60/24;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01B21/30
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