COPOLYMERS HAVING NITRIDE AND ALICYCLIC LEAVING GROUPS AND PHOTORESIST COMPOSITIONS COMPRISING THE SAME

摘要

PURPOSE: Copolymers and resists having nitride and alicyclic leaving groups which can exhibit substantial resistance to plasma etchants are disclosed. CONSTITUTION: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresists include chemically-amplified positive resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. The polymers contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group.