| 摘要 |
PURPOSE: To prevent variations in accuracy of an element pattern due to changes in the thickness of resist film, where the substrate as a whole cannot be heated uniformly. CONSTITUTION: A baking system includes a baking plate 1, having a transformable substrate mounting part 2 and an inner space part 3, and a temperature adjuster 4 joined with the baking plate 1 for circulating temperature adjusting liquid 7 in the space part 3.
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