| 摘要 |
PURPOSE: To provide an integrated gas purification component system and method which filters contaminants from a gas at a much faster rate. CONSTITUTION: The system for purification of a semiconductor manufacturing process chamber comprises a chamber guard diffuser(50) coupled to an inlet of the process chamber(20) to reduce the amount of contaminants entering the process chamber; a chamber purification device(30) positioned within the process chamber and operable to remove contaminants from the process chamber; and a foreline diffuser(40) coupled to a pumping outlet of the process chamber to absorb condensation during evacuation of the process chamber.
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