发明名称 |
INSULATING SUBSTRATE FOR FORMING CONDUCTIVE THIN FILM AND LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME |
摘要 |
PURPOSE: To enhance adhesion of a wiring film to a substrate for the purpose of enhancing reliability of wiring and to enhance resist adhesion for the purpose of enhancing accuracy of wiring patterns. CONSTITUTION: An insulating substrate 101 is cleaned with oxygen plasma, then stabilized by treatment with nitrogen plasma to form a clean treated layer 102. Then a conductive thin film having three-layered structure consisting of a nitried layer 103 of a conductive metal, a nitried layer 104 of a conductive metal, and a nitride layer 105 of a conductive metal is formed by a sputtering method. |
申请公布号 |
KR20010051727(A) |
申请公布日期 |
2001.06.25 |
申请号 |
KR20000067982 |
申请日期 |
2000.11.16 |
申请人 |
HITACHI, LTD. |
发明人 |
CHYAHARA KENICHI;KANEKO TOKISI;ONISAWA KENICHI;TAKAHASHI TAKUYA;TERAKADO MASATOMO |
分类号 |
G02F1/1333;G02F1/133;G02F1/1343;G02F1/1362;G02F1/1368;G09F9/30;H01L21/3205;H01L21/336;H01L21/77;H01L23/52;H01L27/12;H01L29/49;H01L29/786;(IPC1-7):G02F1/133 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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