POSITIVE RESIST COMPOSITION

摘要

PURPOSE: A chemical amplification type positive photoresist composition is provided to ensure improved edge roughness of a pattern and to give an excellent resist pattern profile with high sensitivity. CONSTITUTION: A positive type resist composition contains a compound which generates an acid when irradiated with active light or radiation and a resin containing an alkali-soluble group protected with at least one specified alicyclic hydrocarbon-containing partial structure, having 5% or less monomer content based on the entire pattern area by gel permeation chromatography(GPC) and having the rate of dissolution in an alkali developing solution increased by the acid.