| 摘要 |
PROBLEM TO BE SOLVED: To obtain a high sensitivity positive type radiation sensitive composition having such a resolution as to attain sub-quarter micron patterning. SOLUTION: The positive type radiation sensitive composition contains a polymer containing a structural unit of formula 3 (where R6 is optionally substituted alkyl; R7 is an organic group having one or more acid decomposable groups; R8 is an organic group containing a cyclic organic group in the principal chain; R9 and R10 are each alkyl or aryl which may be substituted by aryl, alkoxy, halohydroxy, alkoxyaryl, haloaryl, silyl, silylaryl, siloxy or siloxyaryl; (q), (r), (s) and (t) show the number of each structural unit contained in the polymer, q>=1, r>=1, s>=0, t>=0 and each structural unit may be regularly incorporated into the polymer or may be contained at random) and an acid generating agent which generates an acid when irradiated. A method for producing a resist pattern using the composition is provided. |
