发明名称 |
NON-ABSORPTIVE RETICLE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a reticle which can decrease thermal strains and allows the use of high illumination energy leading to shortening of exposure time and an increase of a processing quantity. SOLUTION: A translucent substrate is included and a reflection region is disposed on this translucent substrate. An electromagnetic radiation obstruction region is disposed on this reflection region. The reticle is so constituted that the electromagnetic radiation transmitted through the translucent substrate is reflected from the reflection region before arriving at the electromagnetic radiation obstruction region. |
申请公布号 |
JP2001166453(A) |
申请公布日期 |
2001.06.22 |
申请号 |
JP20000325436 |
申请日期 |
2000.10.25 |
申请人 |
SVG LITHOGRAPHY SYST INC |
发明人 |
MCCULLOUGH ANDREW W |
分类号 |
G03F1/00;G03F1/38;G03F1/46;G03F1/54;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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