| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type positive type resist composition containing a resin having a polymerization unit of a (meth)acrylic ester and a polymerization unit of a hydroxystyrene and excellent in resolution. SOLUTION: The chemical amplification type positive type resist composition contains a resin having a polymerization unit of a (meth)acrylic ester of formula I (where Q is H or methyl; R1 and R2 are each a 1-4C alkyl; and R is phenyl which may be substituted by a group selected from hydroxyl, a 1-4C alkyl and a 1-4C hydroxyalkyl or cyclohexyl which may be substituted by a group selected from hydroxyl, oxo, a 1-4C alkyl and a 1-4C hydroxyalkyl) and a polymerization unit of a hydroxystyrene and an acid generating agent. |
