| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a deposited film forming device having such a power impressing electrode that is prevented from causing deformation, such as warping, curving, etc., by the influence of thermal expansion, projected plasma, a deposited thin film, etc., at the time of forming a deposited film. SOLUTION: In the deposited film forming device which forms a deposited film on a substrate in a vacuum vessel by decomposing a reaction gas introduced to the vessel, by generating plasma between a power impressing electrode and the substrate faced oppositely to the electrode, the power impressing electrode is constituted to suppress its deformation, such as warping, curving, etc., by the influence of thermal expansion, projected plasma, a deposited thin film, etc.</p> |
