发明名称 |
LIQUID FILM FORMING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To shorten treatment time and to reduce the quantity of liquids to be used concerning a liquid film forming method for forming a liquid film on a substrate to be treated by relatively moving a liquid drip nozzle and the substrate while dripping liquids from the nozzle. SOLUTION: The relative movement of a liquid drip nozzle 12 and a substrate 11 to be treated is composed of the linear movement of the liquid drip nozzle 12 from one terminal side of the substrate 11 to be treated through the surface of the substrate 11 to the other terminal side of the substrate 11 in a column direction and the movement in a row direction outside the substrate 11, the moving distance in the column direction is calculated by adding a drip length L on the substrate 11 and an acceleration/deceleration block, and a moving velocity(v) on the substrate in the column direction is determined corresponding to the square root of the product of the drip length L and the absolute value of acceleration/deceleration (a). |
申请公布号 |
JP2001168021(A) |
申请公布日期 |
2001.06.22 |
申请号 |
JP20000255461 |
申请日期 |
2000.08.25 |
申请人 |
TOSHIBA CORP |
发明人 |
ITO SHINICHI;EMA TATSUHIKO |
分类号 |
B05C11/00;B05D1/26;B05D1/30;G03F7/16;H01L21/00;H01L21/027 |
主分类号 |
B05C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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