| 摘要 |
PROBLEM TO BE SOLVED: To provide a system which can reduce the absorption of a radiation beam in a lithography projecting device. SOLUTION: In the lithography device using exposure radiation having a relatively short wavelength of 157 nm or 126 nm, an N2 laminar flow which crosses the inside of the operating section of the device and part of a beam passage adjoining to the operating section is supplied. Since the speed of the laminar flow is faster than the maximum speed of the operating section and the diffusing speed of air, the contamination of the N2 of the flow which is caused when the laminar flow is mixed with the air is minimized. It is also possible to maintain the laminar flow by providing a partition wall which divides the beam passage into separated spaces and an aerodynamic member and covering the rough or non-flat surface of an element above or adjoining to the laminar flow.
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