| 摘要 |
PROBLEM TO BE SOLVED: To accurately and adequately inspect a resist pattern by irradiating the resist pattern with illuminating light with an appropriate irradiation quantity. SOLUTION: The image magnification of an image forming optical system 6 is set so that the image resolution by a CCD camera 5 for UV rays may be 10-30 nm on the resist pattern 102 under inspection. Every time the UV CCD camera 5 photographs a frame of image, the resist pattern 102 under inspection is irradiated with illuminating light having a wavelength in the UV range at an irradiating quantity of 0.5 mJ/cm2 or more, an irradiating threshold not shrinking the resist pattern 102 under inspection or an irradiating quantity below the irradiating threshold, not changing the absorption of an antireflective film. |
