发明名称 METHOD OF FORMING WIRING PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a method of forming a wiring pattern whereby the wiring on a substrate can be easily and reliably made and the yield of circuit elements can be improved. SOLUTION: In the wiring pattern forming method using the lift off, a victim layer 41 easily removable from a substrate 2 is formed on the substrate 2, a negative type photo resist layer 42 is laminated on the victim layer 41, this resist layer 42 is exposed through a photo mask 6 masking wiring pattern regions and developed to form a laminate 4 of the victim layer 41 and the negative type photo resist layer 42 on other regions than the wiring pattern regions on the substrate 2, metal films 71, 72 are laminated respectively on the laminate 4 and the substrate 2 on which the laminate 4 is not formed, and the metal film 71 laminated on the laminate 4 is removed together with the laminate 4, thus forming a wiring pattern.
申请公布号 JP2001168096(A) 申请公布日期 2001.06.22
申请号 JP19990347917 申请日期 1999.12.07
申请人 HITACHI CABLE LTD 发明人 WAJIMA MINEO;SATO HIDEKI
分类号 H01L21/3205;H01L21/28;(IPC1-7):H01L21/320 主分类号 H01L21/3205
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