发明名称 DEVELOPMENT PROCESSING DEVICE FOR PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a development processing device for material having a photosensitive resin composition capable of lessening the amount of waste liquid while maintaining the development performance of a development processing liquid. SOLUTION: This development processing device 10 has replenishing means 13 and 14 which replenishes a developing bath 4 with a development replenishing liquid according to at least one of the integrated processing area of the material, the integrated working time of the development processing device 10 and the integrated stop time of the development processing device 10, an intermediate waste liquid tank 2 into which the overflow waste liquid from the developing bath 4 is introduced, a detecting means S which detects development activity of the development processing liquid L in the developing bath 4 and an electrolytic cell 1 which electrolytically treats the liquid used for development introduced from the developing bath 4 and the overflow waste liquid introduced from the intermediate waste liquid tank 2. The device determines whether the electrolytic cell 1 is energized or not according to the development activity detected by a detecting means S.
申请公布号 JP2001166499(A) 申请公布日期 2001.06.22
申请号 JP19990353254 申请日期 1999.12.13
申请人 FUJI PHOTO FILM CO LTD 发明人 FURUKAWA KOJI;OISHI CHIKASHI
分类号 H01L21/027;G03F7/30;(IPC1-7):G03F7/30 主分类号 H01L21/027
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