| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist ashing residual cleaning agent with which the cleaning ability of a photoresist ashing residual is high, the anti-corrosion effect of a base such as insulating film, low-dielectric film or wiring is high and further, corrosion does not occur at the time of rinsing in water. SOLUTION: Concerning the photoresist ashing residual cleaning agent for semiconductor composed of a cleaning component such as super-deionized water or amine, this photoresist ashing residual cleaning agent contains super-deionized water more than 99%. |
