| 发明名称 |
POLISHING COMPOSITIONS FOR SEMICONDUCTOR SUBSTRATES |
| 摘要 |
<p>This invention provides a polishing composition with a stable pH for use in CMP of semiconductor substrates comprising: high-purity submicron particles of a metal oxide and a soluble metal salt of the metal oxide. The metal salt is present in a proportionate amount to adjust the aqueous concentration of metal ions to the equilibrium solubility of the metal oxide at the desired pH of the polishing composition.</p> |
| 申请公布号 |
WO0144395(A1) |
申请公布日期 |
2001.06.21 |
| 申请号 |
WO2000US33508 |
申请日期 |
2000.12.11 |
| 申请人 |
RODEL HOLDINGS, INC. |
发明人 |
THOMAS, TERENCE, M.;LACK, CRAIG, D.;GOEHRINGER, STEVEN, P. |
| 分类号 |
B24B57/02;B24B37/00;C09C1/68;C09G1/02;C09K3/14;C23F1/14;H01L21/304;H01L21/321;(IPC1-7):C09G1/02 |
主分类号 |
B24B57/02 |
| 代理机构 |
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