| 摘要 |
PROBLEM TO BE SOLVED: To provide a hologram exposure system which makes it possible to manufacture a large-sized hologram by long-time exposure even when an inexpensive and unstable single-frequency laser light source is used. SOLUTION: This system is equipped with a splitting means 3 which splits the light beam 2 from a laser light source 1 into a 1st light beam 4 and a 2nd light beam 5, interferometers 6, 8, and 9 which further split and then multiplex the 1st high beam 4 to cause interference, a photoelectric converting means 14 which converts interference fringes generated by the interferometers 6, 8, and 9 into an electric signal, and a transmission selecting means 18 which selects the transmission or nontransmission of the 2nd light beam according to the electric signal obtained by the converting means 14, and a hologram recording material 30 is irradiated with the 2nd light beam 5 having passed through the transmission selecting means 18.
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