| 摘要 |
<p>A production method and device for a hologram, capable recording a hologram irreversibly on transparent materials, semiconductor materials or metallic materials by means of a 2-beam laser interference exposure method, the method comprising the steps of using as a light source a femtosecond laser having a pulse width of 900-10 femtoseconds and a peak output of at least 1 GW and being at a Fourier margin or approximate to it, dividing a pulse from the laser into two by a beam splitter, controlling the two beams in terms of time via an optical delay circuit, controlling them spatially using a mirror having a flat reflection surface and a mirror having a concave reflection surface, the both mirror being rotated finely, condensing them onto a hologram-recording base material surface or a base material interior at an energy density of at least 100 GW/cm2 with polarization surfaces kept in parallel, and making the condensing spots of the two beams agree with each other in terms of time and spatially.</p> |
