| 发明名称 |
HIGH-STRENGTH SPUTTERING TARGETS AND METHOD OF MAKING SAME |
| 摘要 |
Described is a high quality sputtering target and method of manufacture which involves application of equal channel angular extrusion.
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| 申请公布号 |
WO0144536(A2) |
申请公布日期 |
2001.06.21 |
| 申请号 |
WO2000US33997 |
申请日期 |
2000.12.15 |
| 申请人 |
HONEYWELL INC. |
发明人 |
SEGAL, VLADIMIR;FERRASSE, STEPHANE;WILLETT, WILLIAM, B. |
| 分类号 |
B21C23/00;B22D7/00;C22F1/00;C22F1/04;C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
B21C23/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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