发明名称 |
Method of manufacturing a thin film transistor array substrate |
摘要 |
A method of manufacturing a thin film transistor array substrate that includes photolithographically forming an active layer on a substrate. The photoresist mask remaining on the substrate is then removed using a stripper. After stripping, the substrate is immersed in a thin alkali-based solution. The array substrate is then cleaned using distilled water. Source and drain electrodes are then formed on the active layer.
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申请公布号 |
US2001004535(A1) |
申请公布日期 |
2001.06.21 |
申请号 |
US20000734010 |
申请日期 |
2000.12.12 |
申请人 |
KIM HYE-YOUNG;HUH SOON-KU |
发明人 |
KIM HYE-YOUNG;HUH SOON-KU |
分类号 |
H01L29/786;H01L21/336;H01L21/77;H01L21/84;H01L29/417;(IPC1-7):H01L21/00 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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