发明名称 Method of manufacturing a thin film transistor array substrate
摘要 A method of manufacturing a thin film transistor array substrate that includes photolithographically forming an active layer on a substrate. The photoresist mask remaining on the substrate is then removed using a stripper. After stripping, the substrate is immersed in a thin alkali-based solution. The array substrate is then cleaned using distilled water. Source and drain electrodes are then formed on the active layer.
申请公布号 US2001004535(A1) 申请公布日期 2001.06.21
申请号 US20000734010 申请日期 2000.12.12
申请人 KIM HYE-YOUNG;HUH SOON-KU 发明人 KIM HYE-YOUNG;HUH SOON-KU
分类号 H01L29/786;H01L21/336;H01L21/77;H01L21/84;H01L29/417;(IPC1-7):H01L21/00 主分类号 H01L29/786
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