| 摘要 |
In order to manufacture an integrated optical circuit, a first mask (8a) is formed on a face of a substrate (7), the first mask defining the shape of at least one optical device, such as a waveguide, to be formed in a first regio n of the substrate. A second mask (11a) is formed on said face of the substrat e. The second mask corresponds to an optical structure, such as a periodic arra y structure, to be formed in a second region of the substrate, distinct from t he first region. The first and second masks are each made of a material which substantially resists a predetermined etching gas. Then the substrate, supporting the first and second masks, is dry etched using the predetermined etching gas.
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