发明名称 Micro-via-multilayer reconditioning method using laser technology
摘要 A method for exposing a layer of a multi-layer module, in which a conductor path positioned internally is exposed by removal of basic material by means of laser action. The module is formed with a FR4-standard multilayer, and at least one micro-via-additional layer mounted on the multilayer.
申请公布号 DE19960292(A1) 申请公布日期 2001.06.21
申请号 DE19991060292 申请日期 1999.12.14
申请人 SIEMENS AG 发明人 KATZIER, HELMUT;GOLDBERG, MARTIN
分类号 H05K3/00;H05K3/22;H05K3/46;(IPC1-7):H05K3/46;B23K26/00 主分类号 H05K3/00
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